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Author: S. Schreiber


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Reference
B. Faatz, J. Feldhaus, K. Honkavaara, J. Ro?ƒbach, S. Schreiber, and R. Treusch, “FLASH Status and Upgrade”, in Proc. 31st Int. Free Electron Laser Conf. (FEL'09), Liverpool, UK, Aug. 2009, paper WEOA02, pp. 459-462.
S. Schreiber, “First Lasing at FLASH with 4.45 nm”, in Proc. 32nd Int. Free Electron Laser Conf. (FEL'10), Malmö, Sweden, Aug. 2010, paper MOOAI3, pp. 3-3.
S. Schreiber et al., “FLASH Upgrade and First Results”, in Proc. 32nd Int. Free Electron Laser Conf. (FEL'10), Malmö, Sweden, Aug. 2010, paper TUOBI2, pp. 198-201.
S. Schreiber et al., “Operation of the FLASH Photoinjector Laser System”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper THPA18, pp. 507-510.
S. Schreiber et al., “Photocathodes at FLASH”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper THPA19, pp. 511-514.
S. Schreiber, “First Lasing in the Water Window with 4.1nm at FLASH”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper TUOBI2, pp. 164-165.
V. Miltchev et al., “sFLASH - Present Status and Commisioning Results”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper TUPA04, pp. 194-197.
B. Faatz et al., “FLASH II: A Project Update”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper TUPA22, pp. 247-250.
S. Schreiber, B. Faatz, J. Feldhaus, K. Honkavaara, R. Treusch, and M. Vogt, “Status of the FEL User Facility FLASH”, in Proc. 33rd Int. Free Electron Laser Conf. (FEL'11), Shanghai, China, Aug. 2011, paper TUPB04, pp. 267-270.
S. Schreiber, B. Faatz, J. Feldhaus, K. Honkavaara, R. Treusch, and M. Vogt, “Status of the FLASH Facility”, in Proc. 34th Int. Free Electron Laser Conf. (FEL'12), Nara, Japan, Aug. 2012, paper MOPD01, pp. 37-40.


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