Reference Search

Favourites

For Word

[n]	N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, “S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography”, in Proc. IPAC'17, Copenhagen, Denmark, May 2017, pp. 894-897. doi:10.18429/JACoW-IPAC2017-MOPVA020

For LaTeX

%\cite{Nakamura:IPAC17-MOPVA020} \bibitem{Nakamura:IPAC17-MOPVA020} N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, \textquotedblleft{S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography}\textquotedblright, in \emph{Proc. IPAC’17}, Copenhagen, Denmark, May 2017, pp. 894--897. \url{doi:10.18429/JACoW-IPAC2017-MOPVA020}

For BibTeX

@inproceedings{nakamura:ipac17-mopva020, author = {N. Nakamura and R. Kato and T. Miyajima and M. Shimada and R. Hajima and T. Hotei}, title = {{S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography}}, booktitle = {Proc. IPAC'17}, pages = {894--897}, paper = {MOPVA020}, venue = {Copenhagen, Denmark, May 2017}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-IPAC2017-MOPVA020}, url = {https://jacow.org/ipac2017/papers/MOPVA020.pdf}, language = {english} }

References

• N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, “S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography”, in Proc. 8th Int. Particle Accelerator Conf. (IPAC'17), Copenhagen, Denmark, May 2017, pp. 894-897.