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[n]	Y. Socol, G. N. Kulipanov, A. N. Matveenko, O. A. Shevchenko, and N. Vinokurov, “13.5-nm Free-Electron Laser for EUV Lithography”, in Proc. FEL'10, Malmö, Sweden, Aug. 2010, paper TUPA28, pp. 250-253. 

[n]	M. Hahn, J. C. Biasci, H. P. Marques, and A. Meunier, “Upgrade of the ESRF Vacuum System”, in Proc. IPAC'11, San Sebastian, Spain, Sep. 2011, paper TUPS001, pp. 1515-1517. 

For LaTeX

%\cite{Socol:FEL10-TUPA28} \bibitem{Socol:FEL10-TUPA28} Y. Socol, G. N. Kulipanov, A. N. Matveenko, O. A. Shevchenko, and N. Vinokurov, \textquotedblleft{13.5-nm Free-Electron Laser for EUV Lithography}\textquotedblright, in \emph{Proc. FEL’10}, Malmö, Sweden, Aug. 2010, paper TUPA28, pp. 250--253. %\cite{Hahn:IPAC11-TUPS001} \bibitem{Hahn:IPAC11-TUPS001} M. Hahn, J. C. Biasci, H. P. Marques, and A. Meunier, \textquotedblleft{Upgrade of the ESRF Vacuum System}\textquotedblright, in \emph{Proc. IPAC’11}, San Sebastian, Spain, Sep. 2011, paper TUPS001, pp. 1515--1517.

For BibTeX

@inproceedings{socol:fel10-tupa28, author = {Y. Socol and G. N. Kulipanov and A. N. Matveenko and O. A. Shevchenko and N. Vinokurov}, title = {{13.5-nm Free-Electron Laser for EUV Lithography}}, booktitle = {Proc. FEL'10}, pages = {250--253}, paper = {TUPA28}, venue = {Malmö, Sweden, Aug. 2010}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/FEL2010/papers/TUPA28.pdf}, language = {english} } @inproceedings{hahn:ipac11-tups001, author = {M. Hahn and J. C. Biasci and H. P. Marques and A. Meunier}, title = {{Upgrade of the ESRF Vacuum System}}, booktitle = {Proc. IPAC'11}, pages = {1515--1517}, paper = {TUPS001}, venue = {San Sebastian, Spain}, series = {International Particle Accelerator Conference}, number = {2}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {9}, year = {2011}, isbn = {978-9-29-083366-6}, url = {https://jacow.org/IPAC2011/papers/TUPS001.pdf}, language = {english} }

References

• Y. Socol, G. N. Kulipanov, A. N. Matveenko, O. A. Shevchenko, and N. Vinokurov, “13.5-nm Free-Electron Laser for EUV Lithography”, in Proc. 32nd Int. Free Electron Laser Conf. (FEL'10), Malmö, Sweden, Aug. 2010, paper TUPA28, pp. 250-253.
• M. Hahn, J. C. Biasci, H. P. Marques, and A. Meunier, “Upgrade of the ESRF Vacuum System”, in Proc. 2nd Int. Particle Accelerator Conf. (IPAC'11), San Sebastian, Spain, Sep. 2011, paper TUPS001, pp. 1515-1517.