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[n]	Y. Socol, G. N. Kulipanov, A. N. Matveenko, O. A. Shevchenko, and N. Vinokurov, “13.5-nm Free-Electron Laser for EUV Lithography”, in Proc. FEL'10, Malmö, Sweden, Aug. 2010, paper TUPA28, pp. 250-253. 

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