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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 
[n]	Y. Otake, “State-of-the-Art RF Distribution and Synchronization Techniques”, in Proc. FEL'11, Shanghai, China, Aug. 2011, paper FROAI1, pp. 633-640. 

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