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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 
[n]	M. Antonelli et al., “Diamond-Based Photon BPMs for Fast Electron-Beam Diagnostics in Synchrotron Radiation Sources”, in Proc. IBIC'14, Monterey, CA, USA, Sep. 2014, paper TUPF13, pp. 342-345. 

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