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[n]	S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. NAPAC'13, Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744. 

For LaTeX

%\cite{Felch:NAPAC13-WEYB2} \bibitem{Felch:NAPAC13-WEYB2} S. B. Felch, M. I. Current, and M. C. Taylor, \textquotedblleft{Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators}\textquotedblright, in \emph{Proc. NAPAC’13}, Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740--744.

For BibTeX

@inproceedings{felch:napac13-weyb2, author = {S. B. Felch and M. I. Current and M. C. Taylor}, title = {{Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators}}, booktitle = {Proc. NAPAC'13}, pages = {740--744}, paper = {WEYB2}, venue = {Pasadena, CA, USA, Sep.-Oct. 2013}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/PAC2013/papers/WEYB2.pdf}, language = {english} }

References

• S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. North American Particle Accelerator Conf. (NAPAC'13), Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744.