[n] O. A. Tanaka, T. Miyajima, N. Nakamura, and T. Tanikawa, “Injector Design Towards ERL-Based EUV-FEL for Lithography”, in Proc. IPAC'22, Bangkok, Thailand, Jun. 2022, pp. 2299-2302. doi:10.18429/JACoW-IPAC2022-WEPOMS025
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Paper Title: Injector Design Towards ERL-Based EUV-FEL for Lithography
Paper URL: https://jacow.org/IPAC2022/papers/WEPOMS025.pdf
Conference: 13th Int. Particle Accelerator Conf. (IPAC'22)
Paper ID: WEPOMS025
Location in proceedings: 2299-2302
Original Author String: O. A. Tanaka,T. Miyajima,N. Nakamura,T. Tanikawa