[n] N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, “S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography”, in Proc. IPAC'17, Copenhagen, Denmark, May 2017, pp. 894-897. doi:10.18429/JACoW-IPAC2017-MOPVA020
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Paper Title: S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography
Paper URL: https://jacow.org/ipac2017/papers/MOPVA020.pdf
Conference: 8th Int. Particle Accelerator Conf. (IPAC'17)
Paper ID: MOPVA020
Location in proceedings: 894-897
Original Author String: N. Nakamura, R. Kato, T. Miyajima, M. Shimada [KEK, Ibaraki, Japan] R. Hajima [QST, Tokai, Japan] T. Hotei [Sokendai, Ibaraki, Japan]