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Reference

For Word

[n]	N. Nakamura et al., “EUV-FEL light source for future lithography”, in Proc. IPAC'23, Venice, Italy, May 2023, pp. 5149-5152. doi:10.18429/JACoW-IPAC2023-THPM123

For LaTeX

%\cite{Nakamura:IPAC23-THPM123} \bibitem{Nakamura:IPAC23-THPM123} N. Nakamura \emph{et al.}, \textquotedblleft{EUV-FEL light source for future lithography}\textquotedblright, in \emph{Proc. IPAC’23}, Venice, Italy, May 2023, pp. 5149--5152. \url{doi:10.18429/JACoW-IPAC2023-THPM123}

For BibTeX

@inproceedings{nakamura:ipac23-thpm123, author = {N. Nakamura and others}, title = {{EUV-FEL light source for future lithography}}, booktitle = {Proc. IPAC'23}, pages = {5149--5152}, paper = {THPM123}, venue = {Venice, Italy}, series = {International Particle Accelerator Conference}, number = {14}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {9}, year = {2023}, issn = {2673-5490}, isbn = {978-3-95-450231-8}, doi = {10.18429/JACoW-IPAC2023-THPM123}, language = {english} }

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Metadata

Paper Title: EUV-FEL light source for future lithography
Conference: 14th Int. Particle Accelerator Conf. (IPAC'23)
Paper ID: THPM123
Location in proceedings: 5149-5152
Original Author String: N. Nakamura, H. Kawata, H. Sakai, K. Tsuchiya, M. Shimada, O. Tanaka, R. Kato, T. Tanikawa, T. Obina, T. Miyajima, Y. Tanimoto, Y. Honda

Associated Authors

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