Reference Search

Reference

For Word

[n]	E. Chyhyrynets et al., “Plasma Electrolytic Polishing Technology Progress Development for Nb and Cu Substrates Preparation”, in Proc. SRF'23, Grand Rapids, MI, USA, Jun. 2023, pp. 75-79. doi:10.18429/JACoW-SRF2023-MOPMB009

For LaTeX

%\cite{Chyhyrynets:SRF23-MOPMB009} \bibitem{Chyhyrynets:SRF23-MOPMB009} E. Chyhyrynets \emph{et al.}, \textquotedblleft{Plasma Electrolytic Polishing Technology Progress Development for Nb and Cu Substrates Preparation}\textquotedblright, in \emph{Proc. SRF’23}, Grand Rapids, MI, USA, Jun. 2023, pp. 75--79. \url{doi:10.18429/JACoW-SRF2023-MOPMB009}

For BibTeX

@inproceedings{chyhyrynets:srf23-mopmb009, author = {E. Chyhyrynets and others}, title = {{Plasma Electrolytic Polishing Technology Progress Development for Nb and Cu Substrates Preparation}}, booktitle = {Proc. SRF'23}, pages = {75--79}, paper = {MOPMB009}, venue = {Grand Rapids, MI, USA}, series = {International Conference on RF Superconductivity}, number = {21}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {8}, year = {2023}, issn = {2673-5504}, isbn = {978-3-95-450234-9}, doi = {10.18429/JACoW-SRF2023-MOPMB009}, language = {english} }

Use Complete Form

Metadata

Paper Title: Plasma Electrolytic Polishing Technology Progress Development for Nb and Cu Substrates Preparation
Conference: 21th Int. Conf. RF Superconductivity (SRF'23)
Paper ID: MOPMB009
Location in proceedings: 75-79
Original Author String: E. Chyhyrynets,O. Azzolini,R. Caforio,D. Fonnesu,D. Ford,G. Keppel,G. Marconato,C. Pira,A. Salmaso,F. Stivanello

Associated Authors

Back to the list