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Reference

For Word

[n]	P. Y. Nabhiraj, R. K. Bhandari, G. G, C. Mallik, R. Menon, and S. Mohan, “Design of High Current RF Ion Source for Micromachining Applications”, in Proc. APAC'07, Indore, India, Jan.-Feb. 2007, paper TUPMA113, pp. 262-264.

For LaTeX

%\cite{Nabhiraj:APAC07-TUPMA113} \bibitem{Nabhiraj:APAC07-TUPMA113} P. Y. Nabhiraj, R. K. Bhandari, G. G, C. Mallik, R. Menon, and S. Mohan, \textquotedblleft{Design of High Current RF Ion Source for Micromachining Applications}\textquotedblright, in \emph{Proc. APAC’07}, Indore, India, Jan.-Feb. 2007, paper TUPMA113, pp. 262--264.

For BibTeX

@inproceedings{nabhiraj:apac07-tupma113, author = {P. Y. Nabhiraj and R. K. Bhandari and G. G and C. Mallik and R. Menon and S. Mohan}, title = {{Design of High Current RF Ion Source for Micromachining Applications}}, booktitle = {Proc. APAC'07}, pages = {262--264}, paper = {TUPMA113}, venue = {Indore, India, Jan.-Feb. 2007}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/a07/papers/TUPMA113.pdf}, language = {english} }

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Metadata

Paper Title: Design of High Current RF Ion Source for Micromachining Applications
Paper URL: https://jacow.org/a07/papers/TUPMA113.pdf
Conference: 4th Asian Particle Accelerator Conf. (APAC'07)
Paper ID: TUPMA113
Location in proceedings: 262-264
Original Author String: P.Y. Nabhiraj, R.K. Bhandari, DAE/VECC, Calcutta; G. G, IISC, Bangalore; C. Mallik, R. Menon, DAE/VECC, Calcutta; S. Mohan, IISC, Bangalore

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