[n] S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. NAPAC'13, Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744.
Use Complete Form
Paper Title: Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators
Paper URL: https://jacow.org/PAC2013/papers/WEYB2.pdf
Conference: North American Particle Accelerator Conf. (NAPAC'13)
Paper ID: WEYB2
Location in proceedings: 740-744
Original Author String: S.B. Felch [Susan Felch Consulting, Los Altos Hills, California, USA] M.I. Current [Current Scientific, San Jose, USA] M.C. Taylor [Taylor Consulting, USA]
