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Reference

For Word

[n]	M. Goldstein et al., “FEL Applications in EUV Lithography”, in Proc. FEL'05, Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX-XX.

For LaTeX

%\cite{Goldstein:FEL05-THOA002} \bibitem{Goldstein:FEL05-THOA002} M. Goldstein \emph{et al.}, \textquotedblleft{FEL Applications in EUV Lithography}\textquotedblright, in \emph{Proc. FEL’05}, Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX--XX.

For BibTeX

@inproceedings{goldstein:fel05-thoa002, author = {M. Goldstein and others}, title = {{FEL Applications in EUV Lithography}}, booktitle = {Proc. FEL'05}, paper = {THOA002}, venue = {Palo Alto, CA, USA, Aug. 2005}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/f05/papers/THOA002.pdf}, language = {english} }

Use Complete Form

Metadata

Paper Title: FEL Applications in EUV Lithography
Paper URL: https://jacow.org/f05/papers/THOA002.pdf
Conference: 27th Int. Free Electron Laser Conf. (FEL'05)
Paper ID: THOA002
Location in proceedings:
Original Author String: M. Goldstein, S.H. Lee, Intel, Santa Clara, California; R. Pantell, Stanford University, Stanford, Califormia; H. Park, M.A. Piestrup, Adelphi Technology, Inc., San Carlos, California; Y.A. Shroff, P.J. Silverman, D. Williams, Intel, Santa Clara, California

Associated Authors

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