[n] K. Kim et al., “Design of a 1.2 GeV Synchrotron Light Source for X-Ray Lithography at Samsung Heavy Industries”, in Proc. PAC'95, Dallas, TX, USA, May 1995, paper FAR03, pp. 269-271.
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Paper Title: Design of a 1.2 GeV Synchrotron Light Source for X-Ray Lithography at Samsung Heavy Industries
Conference: 16th Particle Accelerator Conf. (PAC'95)
Paper ID: FAR03
Location in proceedings: 269-271
Original Author String: Keeman Kim, Bumsoo Han, Kihun Joh, Sungmyun Kim, Byungmun Kim, Heunggyu Park, Jongpil Park, Jinsoo Kim, Wongu Kang, Kyungwoo Kang, Yuri Kim, Sangil Lee, Younghee Kim
