Reference Search

[n]	Y. Lee et al., “Multicusp Ion Source for Ion Projection Lithography”, in Proc. PAC'99, New York, NY, USA, Mar. 1999, paper WEP144, pp. 2575-2577. 

Paper Title: Multicusp Ion Source for Ion Projection Lithography
Paper URL: https://jacow.org/p99/papers/WEP144.pdf
Conference: 18th Particle Accelerator Conf. (PAC'99)
Paper ID: WEP144
Location in proceedings: 2575-2577
Original Author String: Y. Lee, K.N. Leung, M.D. Williams, LBNL, Berkeley, CA; W.H. Bruenger, Fraunhofer Institute for Silicon Technology, Berlin, Germany; W. Fallmann, Technical University of Vienna, Vienna, Austria; H. Loschner, G. Stengl, IMS - Ion Microfabrication Systems GmbH, Vienna, Austria

Associated Authors

• Y. Lee
• K. N. Leung
• M. D. Williams
• W. H. Bruenger
• W. Fallmann
• H. Loschner
• G. Stengl