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[n]	G. Wu et al., “ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities”, in Proc. SRF'07, Beijing, China, Oct. 2007, paper TUP49, pp. XX-XX.

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Paper Title: ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities
Paper URL: https://jacow.org/srf2007/papers/TUP49.pdf
Conference: 13th Int. Conf. RF Superconductivity (SRF'07)
Paper ID: TUP49
Location in proceedings:
Original Author String: G. Wu, H. Jiang, T. Khabiboulline, I. Pechenezhskiy, T. Koeth, J. Reid, W. Muranyi, B. Tennis, E. Harms, Y. Terechkine, H. Edwards, D. Mitchell, A. Rowe, C. Boffo, C. Cooper, L. Cooley, R. Schuessler, Fermilab; W. -D. Moeller, DESY Hamburg; C. Antoine, CEA-Saclay; A. Romanenko, Cornell University

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