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[n]	D. Luo et al., “Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid”, in Proc. NAPAC'19, Lansing, MI, USA, Sep. 2019, pp. 699-702. doi:10.18429/JACoW-NAPAC2019-WEPLM47

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Paper Title: Analysis of High Field Q-Slope (HFQS) Causes and Development of New Chemical Polishing Acid
Paper URL: https://jacow.org/napac2019/papers/WEPLM47.pdf
Conference: North American Particle Accelerator Conf. (NAPAC'19)
Paper ID: WEPLM47
Location in proceedings: 699-702
Original Author String: D. Luo,E. S. Metzgar,T. Nakajima,I. Nasu,L. Popielarski,K. Saito,S. M. Shanab,G. V. Simpson,J. Taguchi

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