[n] N. Nakamura et al., “Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography”, in Proc. IPAC'19, Melbourne, Australia, May 2019, pp. 3478-3481. doi:10.18429/JACoW-IPAC2019-THPMP013
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                Paper Title: Challenges Towards Industrialization of the ERL-FEL Light Source for EUV Lithography
                                    Paper URL: http://accelconf.web.cern.ch/ipac2019/papers/THPMP013.pdf
                                Conference: 10th Int. Particle Accelerator Conf. (IPAC'19)
                Paper ID: THPMP013
                                    Location in proceedings: 3478-3481
                                                    Original Author String: N. Nakamura,E. Kako,R. Kato,H. Kawata,T. Miyajima,H. Sakai,K. Umemori