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Author: A. Y. Murokh


References



Reference
T. J. Campese et al., “Multi-Diagnostic Transverse Profile Monitor Chamber for Extreme Ultraviolet Lithography”, in Proc. 4th Int. Beam Instrumentation Conf. (IBIC'15), Melbourne, Australia, Sep. 2015, pp. 554-556.
T. J. Campese et al., “Strongly Tapered Helical Undulator System for TESSA-266”, in Proc. North American Particle Accelerator Conf. (NAPAC'19), Lansing, MI, USA, Sep. 2019, pp. 63-66.
T. J. Hodgetts et al., “Compact Inter-Undulator Diagnostic Assembly for TESSA-515”, in Proc. North American Particle Accelerator Conf. (NAPAC'22), Albuquerque, NM, USA, Aug. 2022, pp. 732-734.
Y. Park et al., “Status Update for the High Gain High Efficiency TESSA-266 Experiment”, in Proc. 39th Int. Free Electron Laser Conf. (FEL'19), Hamburg, Germany, Aug. 2019, pp. 730-733.
Y. Park et al., “Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm”, in Proc. 38th Int. Free Electron Laser Conf. (FEL'17), Santa Fe, NM, USA, Aug. 2017, pp. 49-52.


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