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Author: H. Mizoguchi


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Reference
A. Endo, K. Sakaue, M. Washio, and H. Mizoguchi, “Optimization of High Average Power FEL Beam for EUV Lithography Application”, in Proc. 36th Int. Free Electron Laser Conf. (FEL'14), Basel, Switzerland, Aug. 2014, paper FRA04, pp. 990-992.


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