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Reference

For Word

[n]	A. Endo, K. Sakaue, M. Washio, and H. Mizoguchi, “Optimization of High Average Power FEL Beam for EUV Lithography Application”, in Proc. FEL'14, Basel, Switzerland, Aug. 2014, paper FRA04, pp. 990-992.

For LaTeX

%\cite{Endo:FEL14-FRA04} \bibitem{Endo:FEL14-FRA04} A. Endo, K. Sakaue, M. Washio, and H. Mizoguchi, \textquotedblleft{Optimization of High Average Power FEL Beam for EUV Lithography Application}\textquotedblright, in \emph{Proc. FEL’14}, Basel, Switzerland, Aug. 2014, paper FRA04, pp. 990--992.

For BibTeX

@inproceedings{endo:fel14-fra04, author = {A. Endo and K. Sakaue and M. Washio and H. Mizoguchi}, title = {{Optimization of High Average Power FEL Beam for EUV Lithography Application}}, booktitle = {Proc. FEL'14}, pages = {990--992}, paper = {FRA04}, venue = {Basel, Switzerland, Aug. 2014}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/FEL2014/papers/FRA04.pdf}, language = {english} }

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Metadata

Paper Title: Optimization of High Average Power FEL Beam for EUV Lithography Application
Paper URL: https://jacow.org/FEL2014/papers/FRA04.pdf
Conference: 36th Int. Free Electron Laser Conf. (FEL'14)
Paper ID: FRA04
Location in proceedings: 990-992
Original Author String: A. Endo, K. Sakaue, M. Washio [Waseda University, Tokyo, Japan] H. Mizoguchi [Gigaphoton Inc, Hiratsuka, Kanagawa, Japan]

Associated Authors

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