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[n]	Y. Park et al., “Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm”, in Proc. FEL'17, Santa Fe, NM, USA, Aug. 2017, pp. 49-52. doi:10.18429/JACoW-FEL2017-MOP011

[n]	A. Khan, S. K. Sharma, and V. V. Smaluk, “Review of Alignment and Stability Tolerances for Advanced Light Sources”, in Proc. IPAC'22, Bangkok, Thailand, Jun. 2022, pp. 588-591. doi:10.18429/JACoW-IPAC2022-MOPOTK054

For LaTeX

%\cite{Park:FEL17-MOP011} \bibitem{Park:FEL17-MOP011} Y. Park \emph{et al.}, \textquotedblleft{Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm}\textquotedblright, in \emph{Proc. FEL’17}, Santa Fe, NM, USA, Aug. 2017, pp. 49--52. \doi{10.18429/JACoW-FEL2017-MOP011} %\cite{Khan:IPAC22-MOPOTK054} \bibitem{Khan:IPAC22-MOPOTK054} A. Khan, S. K. Sharma, and V. V. Smaluk, \textquotedblleft{Review of Alignment and Stability Tolerances for Advanced Light Sources}\textquotedblright, in \emph{Proc. IPAC’22}, Bangkok, Thailand, Jun. 2022, pp. 588--591. \doi{10.18429/JACoW-IPAC2022-MOPOTK054}

For BibTeX

@inproceedings{park:fel17-mop011, author = {Y. Park and others}, title = {{Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm}}, booktitle = {Proc. FEL'17}, pages = {49--52}, paper = {MOP011}, venue = {Santa Fe, NM, USA, Aug. 2017}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-FEL2017-MOP011}, url = {https://jacow.org/fel2017/papers/MOP011.pdf}, language = {english} } @inproceedings{khan:ipac22-mopotk054, author = {A. Khan and S. K. Sharma and V. V. Smaluk}, title = {{Review of Alignment and Stability Tolerances for Advanced Light Sources}}, booktitle = {Proc. IPAC'22}, pages = {588--591}, paper = {MOPOTK054}, venue = {Bangkok, Thailand}, series = {International Particle Accelerator Conference}, number = {13}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {7}, year = {2022}, issn = {2673-5490}, isbn = {978-3-95-450227-1}, doi = {10.18429/JACoW-IPAC2022-MOPOTK054}, url = {https://jacow.org/IPAC2022/papers/MOPOTK054.pdf}, language = {english} }

References

• Y. Park et al., “Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm”, in Proc. 38th Int. Free Electron Laser Conf. (FEL'17), Santa Fe, NM, USA, Aug. 2017, pp. 49-52.
• A. Khan, S. K. Sharma, and V. V. Smaluk, “Review of Alignment and Stability Tolerances for Advanced Light Sources”, in Proc. 13th Int. Particle Accelerator Conf. (IPAC'22), Bangkok, Thailand, Jun. 2022, pp. 588-591.