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[n]	T. Thuillier, O. Bajeat, A. Leduc, and L. Maunoury, “Angular Distribution Measurement of Atoms Evaporated from a Resistive Oven Applied to Ion Beam Production”, in Proc. ECRIS'20, East Lansing, MI, USA, Sep. 2020, pp. 72-77. doi:10.18429/JACoW-ECRIS2020-TUXZO03

[n]	D. T. Button, D. B. Garton, M. C. Mann, and S. Yan, “Advancements in the Management Measurements & Visualisation of NEC Beam Profile Monitors”, in Proc. IBIC'15, Melbourne, Australia, Sep. 2015, pp. 298-301. doi:10.18429/JACoW-IBIC2015-TUPB005

For LaTeX

%\cite{Thuillier:ECRIS20-TUXZO03} \bibitem{Thuillier:ECRIS20-TUXZO03} T. Thuillier, O. Bajeat, A. Leduc, and L. Maunoury, \textquotedblleft{Angular Distribution Measurement of Atoms Evaporated from a Resistive Oven Applied to Ion Beam Production}\textquotedblright, in \emph{Proc. ECRIS’20}, East Lansing, MI, USA, Sep. 2020, pp. 72--77. \doi{10.18429/JACoW-ECRIS2020-TUXZO03} %\cite{Button:IBIC15-TUPB005} \bibitem{Button:IBIC15-TUPB005} D. T. Button, D. B. Garton, M. C. Mann, and S. Yan, \textquotedblleft{Advancements in the Management Measurements & Visualisation of NEC Beam Profile Monitors}\textquotedblright, in \emph{Proc. IBIC’15}, Melbourne, Australia, Sep. 2015, pp. 298--301. \doi{10.18429/JACoW-IBIC2015-TUPB005}

For BibTeX

@inproceedings{thuillier:ecris20-tuxzo03, author = {T. Thuillier and O. Bajeat and A. Leduc and L. Maunoury}, title = {{Angular Distribution Measurement of Atoms Evaporated from a Resistive Oven Applied to Ion Beam Production}}, booktitle = {Proc. ECRIS'20}, pages = {72--77}, paper = {TUXZO03}, venue = {East Lansing, MI, USA}, series = {International Workshop on ECR Ion Sources # series}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {7}, year = {2022}, issn = {2222-5692}, isbn = {978-3-95-450226-4}, doi = {10.18429/JACoW-ECRIS2020-TUXZO03}, url = {https://jacow.org/ecris2020/papers/tuxzo03.pdf}, language = {english} } @inproceedings{button:ibic15-tupb005, author = {D. T. Button and D. B. Garton and M. C. Mann and S. Yan}, title = {{Advancements in the Management Measurements & Visualisation of NEC Beam Profile Monitors}}, booktitle = {Proc. IBIC'15}, pages = {298--301}, paper = {TUPB005}, venue = {Melbourne, Australia, Sep. 2015}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-IBIC2015-TUPB005}, url = {https://jacow.org/IBIC2015/papers/TUPB005.pdf}, language = {english} }

References

• T. Thuillier, O. Bajeat, A. Leduc, and L. Maunoury, “Angular Distribution Measurement of Atoms Evaporated from a Resistive Oven Applied to Ion Beam Production”, in Proc. 24th International Workshop on ECR Ion Sources (ECRIS'20), East Lansing, MI, USA, Sep. 2020, paper TUXZO03, pp. 72-77.
• D. T. Button, D. B. Garton, M. C. Mann, and S. Yan, “Advancements in the Management Measurements & Visualisation of NEC Beam Profile Monitors”, in Proc. 4th Int. Beam Instrumentation Conf. (IBIC'15), Melbourne, Australia, Sep. 2015, pp. 298-301.