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[n]	M. Goldstein et al., “FEL Applications in EUV Lithography”, in Proc. FEL'05, Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX-XX. 
[n]	C. GARCIA JAIMES, L. van Riesen-Haupt, R. Tomas, and T. Pieloni, “Exploring FCC-ee optics designs with combined function magnets”, in Proc. IPAC'23, Venice, Italy, May 2023, pp. 698-701. doi:10.18429/JACoW-IPAC2023-MOPL066

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