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[n] J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.
[n] Y. Yuan, G. Franchetti, H. Liu, and S. Wang, “Study of high-intensity bunch merging and its experimental application on rapid cycling synchrotrons”, in Proc. IPAC'23, Venice, Italy, May 2023, pp. 2701-2704. doi:10.18429/JACoW-IPAC2023-WEPA024
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References
- J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.
- Y. Yuan, G. Franchetti, H. Liu, and S. Wang, “Study of high-intensity bunch merging and its experimental application on rapid cycling synchrotrons”, in Proc. 14th Int. Particle Accelerator Conf. (IPAC'23), Venice, Italy, May 2023, paper WEPA024, pp. 2701-2704.
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