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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 

[n]	A. Blednykh et al., “EIC impedance and beam dynamics”, in Proc. IPAC'24, Nashville, TN, USA, May 2024, pp. 3094-3097. doi:10.18429/JACoW-IPAC2024-THPC45

[n]	R. W. Moses, R. S. Christian, A. J. Dragt, and E. A. Heighway, “Scaling Laws for Abberations in Magnetic Quadrupole Lens Systems”, in Proc. PAC'87, Washington D.C., USA, Mar. 1987, pp. 1764-1767. 

For LaTeX

%\cite{Poate:PAC01-FOAA008} \bibitem{Poate:PAC01-FOAA008} J. Poate and M. I. Current, \textquotedblleft{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}\textquotedblright, presented at the PAC’01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. %\cite{Blednykh:IPAC24-THPC45} \bibitem{Blednykh:IPAC24-THPC45} A. Blednykh \emph{et al.}, \textquotedblleft{EIC impedance and beam dynamics}\textquotedblright, in \emph{Proc. IPAC’24}, Nashville, TN, USA, May 2024, pp. 3094--3097. \doi{10.18429/JACoW-IPAC2024-THPC45} %\cite{Moses:PAC87} \bibitem{Moses:PAC87} R. W. Moses, R. S. Christian, A. J. Dragt, and E. A. Heighway, \textquotedblleft{Scaling Laws for Abberations in Magnetic Quadrupole Lens Systems}\textquotedblright, in \emph{Proc. PAC’87}, Washington D.C., USA, Mar. 1987, pp. 1764--1767.

For BibTeX

@unpublished{poate:pac01-foaa008, author = {J. Poate and M. I. Current}, title = {{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}}, booktitle = {Proc. PAC'01}, paper = {FOAA008}, venue = {Chicago, IL, USA, Jun. 2001}, intype = {presented at the}, publisher = {JACoW Publishing, Geneva, Switzerland}, note = {presented at PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished}, language = {english} } @inproceedings{blednykh:ipac24-thpc45, author = {A. Blednykh and others}, title = {{EIC impedance and beam dynamics}}, booktitle = {Proc. IPAC'24}, pages = {3094--3097}, paper = {THPC45}, venue = {Nashville, TN, USA}, series = {International Particle Accelerator Conference}, number = {15}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {7}, year = {2024}, issn = {2673-5490}, isbn = {978-3-95-450247-9}, doi = {10.18429/JACoW-IPAC2024-THPC45}, language = {english} } @inproceedings{moses:pac87, author = {R. W. Moses and R. S. Christian and A. J. Dragt and E. A. Heighway}, title = {{Scaling Laws for Abberations in Magnetic Quadrupole Lens Systems}}, booktitle = {Proc. PAC'87}, pages = {1764--1767}, paper = {}, venue = {Washington D.C., USA, Mar. 1987}, publisher = {JACoW Publishing, Geneva, Switzerland}, language = {english} }

References

• J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.
• A. Blednykh et al., “EIC impedance and beam dynamics”, in Proc. 15th Int. Particle Accelerator Conf. (IPAC'24), Nashville, TN, USA, May 2024, paper THPC45, pp. 3094-3097.
• R. W. Moses, R. S. Christian, A. J. Dragt, and E. A. Heighway, “Scaling Laws for Abberations in Magnetic Quadrupole Lens Systems”, in Proc. 12th Particle Accelerator Conf. (PAC'87), Washington D.C., USA, Mar. 1987, pp. 1764-1767.