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[n] S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. NAPAC'13, Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744.
[n] D. Schulte et al., “CLIC Magnet Stabilization Studies”, in Proc. LINAC'04, Lübeck, Germany, Aug. 2004, paper TUP88, pp. 483-485.
[n] Z.-J. Zhang and W. Liu, “A compact linear accelerator coaxially integrated with a high-power microwave source”, presented at the IPAC'25, Taipei, Taiwan, Jun. 2025, paper TUPM088, unpublished.
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References
- S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. North American Particle Accelerator Conf. (NAPAC'13), Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744.
- D. Schulte et al., “CLIC Magnet Stabilization Studies”, in Proc. 22nd Linear Accelerator Conf. (LINAC'04), Lübeck, Germany, Aug. 2004, paper TUP88, pp. 483-485.
- Z.-J. Zhang and W. Liu, “A compact linear accelerator coaxially integrated with a high-power microwave source”, presented at the 16th Int. Particle Accelerator Conf. (IPAC'25), Taipei, Taiwan, Jun. 2025, paper TUPM088, unpublished.
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