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[n]	S. B. Felch, M. I. Current, and M. C. Taylor, “Ion Implantation for Semiconductor Devices: The Largest Use of Industrial Accelerators”, in Proc. NAPAC'13, Pasadena, CA, USA, Sep.-Oct. 2013, paper WEYB2, pp. 740-744. 
[n]	M. G. Zeitlin and A. N. Fedorova, “Fast Calculation Methods in Collective Dynamical Models of Beam/Plasma Physics”, in Proc. EPAC'02, Paris, France, Jun. 2002, paper WEPRI114, pp. 1434-1436. 

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