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For Word

[n]	H. Wang, J. Delayen, L. Harwood, C. Hovater, and R. Nelson, “JLAB High Efficiency Klystron Baseline Design for 12 GeV Upgrade”, in Proc. PAC'03, Portland, OR, USA, May 2003, paper TPAE010, pp. 1098-1100. 

[n]	K. Saito et al., “Superiority of Electropolishing over Chemical Polishing on High Gradients”, in Proc. SRF'97, Padova, Italy, Oct. 1997, paper SRF97D02, pp. 795-813. 

For LaTeX

%\cite{Wang:PAC03-TPAE010} \bibitem{Wang:PAC03-TPAE010} H. Wang, J. Delayen, L. Harwood, C. Hovater, and R. Nelson, \textquotedblleft{JLAB High Efficiency Klystron Baseline Design for 12 GeV Upgrade}\textquotedblright, in \emph{Proc. PAC’03}, Portland, OR, USA, May 2003, paper TPAE010, pp. 1098--1100. %\cite{Saito:SRF97-SRF97D02} \bibitem{Saito:SRF97-SRF97D02} K. Saito \emph{et al.}, \textquotedblleft{Superiority of Electropolishing over Chemical Polishing on High Gradients}\textquotedblright, in \emph{Proc. SRF’97}, Padova, Italy, Oct. 1997, paper SRF97D02, pp. 795--813.

For BibTeX

@inproceedings{wang:pac03-tpae010, author = {H. Wang and J. Delayen and L. Harwood and C. Hovater and R. Nelson}, title = {{JLAB High Efficiency Klystron Baseline Design for 12 GeV Upgrade}}, booktitle = {Proc. PAC'03}, pages = {1098--1100}, paper = {TPAE010}, venue = {Portland, OR, USA, May 2003}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/p03/papers/TPAE010.pdf}, language = {english} } @inproceedings{saito:srf97-srf97d02, author = {K. Saito and others}, title = {{Superiority of Electropolishing over Chemical Polishing on High Gradients}}, booktitle = {Proc. SRF'97}, pages = {795--813}, paper = {SRF97D02}, venue = {Padova, Italy, Oct. 1997}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/SRF97/papers/SRF97D02.pdf}, language = {english} }

References

• H. Wang, J. Delayen, L. Harwood, C. Hovater, and R. Nelson, “JLAB High Efficiency Klystron Baseline Design for 12 GeV Upgrade”, in Proc. 20th Particle Accelerator Conf. (PAC'03), Portland, OR, USA, May 2003, paper TPAE010, pp. 1098-1100.
• K. Saito et al., “Superiority of Electropolishing over Chemical Polishing on High Gradients”, in Proc. 8th Int. Conf. RF Superconductivity (SRF'97), Padova, Italy, Oct. 1997, paper SRF97D02, pp. 795-813.