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[n]	K. Kim et al., “Design of a 1.2 GeV Synchrotron Light Source for X-Ray Lithography at Samsung Heavy Industries”, in Proc. PAC'95, Dallas, TX, USA, May 1995, paper FAR03, pp. 269-271. 
[n]	G. Vashchenko et al., “Emittance Optimization for Different Bunch Charges with Upgraded Setup at PITZ”, in Proc. IPAC'11, San Sebastian, Spain, Sep. 2011, paper THPC115, pp. 3155-3157. 
[n]	T. Walter, I. Mahns, and H. Schlarb, “MICROTCA TECHNOLOGY LAB AT DESY: CURRENT CASES IN TECHNOLOGY TRANSFER”, in Proc. IPAC'19, Melbourne, Australia, May 2019, pp. 3459-3461. doi:10.18429/JACoW-IPAC2019-THPMP007

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