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[n]	N. Nakamura et al., “EUV-FEL light source for future lithography”, in Proc. IPAC'23, Venice, Italy, May 2023, pp. 5149-5152. doi:10.18429/JACoW-IPAC2023-THPM123
[n]	S. Gayadeen, M. T. Heron, and G. Rehm, “Robust Stability Analysis of Orbit Feedback Controllers”, in Proc. ICALEPCS'15, Melbourne, Australia, Oct. 2015, pp. 502-505. doi:10.18429/JACoW-ICALEPCS2015-MOPGF177

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