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[n]	K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. IPAC'10, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150. 

[n]	M. Pieck et al., “Recent Enhancements to the Los Alamos Isotope Production Facility”, in Proc. ICALEPCS'17, Barcelona, Spain, Oct. 2017, pp. 548-552. doi:10.18429/JACoW-ICALEPCS2017-TUPHA065

For LaTeX

%\cite{Sakaue:IPAC10-MOPEA036} \bibitem{Sakaue:IPAC10-MOPEA036} K. Sakaue, A. Endo, and M. Washio, \textquotedblleft{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}\textquotedblright, in \emph{Proc. IPAC’10}, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148--150. %\cite{Pieck:ICALEPCS17-TUPHA065} \bibitem{Pieck:ICALEPCS17-TUPHA065} M. Pieck \emph{et al.}, \textquotedblleft{Recent Enhancements to the Los Alamos Isotope Production Facility}\textquotedblright, in \emph{Proc. ICALEPCS’17}, Barcelona, Spain, Oct. 2017, pp. 548--552. \doi{10.18429/JACoW-ICALEPCS2017-TUPHA065}

For BibTeX

@inproceedings{sakaue:ipac10-mopea036, author = {K. Sakaue and A. Endo and M. Washio}, title = {{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}}, booktitle = {Proc. IPAC'10}, pages = {148--150}, paper = {MOPEA036}, venue = {Kyoto, Japan, May 2010}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {http://accelconf.web.cern.ch/IPAC10/papers/MOPEA036.pdf}, language = {english} } @inproceedings{pieck:icalepcs17-tupha065, author = {M. Pieck and others}, title = {{Recent Enhancements to the Los Alamos Isotope Production Facility}}, booktitle = {Proc. ICALEPCS'17}, pages = {548--552}, paper = {TUPHA065}, venue = {Barcelona, Spain, Oct. 2017}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-ICALEPCS2017-TUPHA065}, url = {https://jacow.org/icalepcs2017/papers/TUPHA065.pdf}, language = {english} }

References

• K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. 1st Int. Particle Accelerator Conf. (IPAC'10), Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150.
• M. Pieck et al., “Recent Enhancements to the Los Alamos Isotope Production Facility”, in Proc. 16th Int. Conf. on Accelerator and Large Experimental Physics Control Systems (ICALEPCS'17), Barcelona, Spain, Oct. 2017, pp. 548-552.