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[n]	M. K. Fukuda et al., “Beam-Loading Compensation of a Multi-Bunch Electron Beam by Using RF Amplitude Modulation in Laser Undulator Compact X-Ray Source (LUCX)”, in Proc. LINAC'16, East Lansing, MI, USA, Sep. 2016, pp. 867-869. doi:10.18429/JACoW-LINAC2016-THPLR012

[n]	M. Goldstein et al., “FEL Applications in EUV Lithography”, in Proc. FEL'05, Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX-XX. 

For LaTeX

%\cite{Fukuda:LINAC16-THPLR012} \bibitem{Fukuda:LINAC16-THPLR012} M. K. Fukuda \emph{et al.}, \textquotedblleft{Beam-Loading Compensation of a Multi-Bunch Electron Beam by Using RF Amplitude Modulation in Laser Undulator Compact X-Ray Source (LUCX)}\textquotedblright, in \emph{Proc. LINAC’16}, East Lansing, MI, USA, Sep. 2016, pp. 867--869. \doi{10.18429/JACoW-LINAC2016-THPLR012} %\cite{Goldstein:FEL05-THOA002} \bibitem{Goldstein:FEL05-THOA002} M. Goldstein \emph{et al.}, \textquotedblleft{FEL Applications in EUV Lithography}\textquotedblright, in \emph{Proc. FEL’05}, Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX--XX.

For BibTeX

@inproceedings{fukuda:linac16-thplr012, author = {M. K. Fukuda and others}, title = {{Beam-Loading Compensation of a Multi-Bunch Electron Beam by Using RF Amplitude Modulation in Laser Undulator Compact X-Ray Source (LUCX)}}, booktitle = {Proc. LINAC'16}, pages = {867--869}, paper = {THPLR012}, venue = {East Lansing, MI, USA}, series = {Linear Accelerator Conference}, number = {28}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {5}, year = {2017}, isbn = {978-3-95-450169-4}, doi = {10.18429/JACoW-LINAC2016-THPLR012}, url = {https://jacow.org/linac2016/papers/THPLR012.pdf}, language = {english} } @inproceedings{goldstein:fel05-thoa002, author = {M. Goldstein and others}, title = {{FEL Applications in EUV Lithography}}, booktitle = {Proc. FEL'05}, paper = {THOA002}, venue = {Palo Alto, CA, USA, Aug. 2005}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/f05/papers/THOA002.pdf}, language = {english} }

References

• M. K. Fukuda et al., “Beam-Loading Compensation of a Multi-Bunch Electron Beam by Using RF Amplitude Modulation in Laser Undulator Compact X-Ray Source (LUCX)”, in Proc. 28th Linear Accelerator Conf. (LINAC'16), East Lansing, MI, USA, Sep. 2016, pp. 867-869.
• M. Goldstein et al., “FEL Applications in EUV Lithography”, in Proc. 27th Int. Free Electron Laser Conf. (FEL'05), Palo Alto, CA, USA, Aug. 2005, paper THOA002, pp. XX-XX.