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[n]	Y. Otake et al., “Sub-Pico-Second Trigger System for the SCSS Prototype Accelerator”, in Proc. FEL'06, Berlin, Germany, Aug.-Sep. 2006, paper THPPH033, pp. 645-648. 

[n]	N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, “S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography”, in Proc. IPAC'17, Copenhagen, Denmark, May 2017, pp. 894-897. doi:10.18429/JACoW-IPAC2017-MOPVA020

For LaTeX

%\cite{Otake:FEL06-THPPH033} \bibitem{Otake:FEL06-THPPH033} Y. Otake \emph{et al.}, \textquotedblleft{Sub-Pico-Second Trigger System for the SCSS Prototype Accelerator}\textquotedblright, in \emph{Proc. FEL’06}, Berlin, Germany, Aug.-Sep. 2006, paper THPPH033, pp. 645--648. %\cite{Nakamura:IPAC17-MOPVA020} \bibitem{Nakamura:IPAC17-MOPVA020} N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, \textquotedblleft{S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography}\textquotedblright, in \emph{Proc. IPAC’17}, Copenhagen, Denmark, May 2017, pp. 894--897. \doi{10.18429/JACoW-IPAC2017-MOPVA020}

For BibTeX

@inproceedings{otake:fel06-thpph033, author = {Y. Otake and others}, title = {{Sub-Pico-Second Trigger System for the SCSS Prototype Accelerator}}, booktitle = {Proc. FEL'06}, pages = {645--648}, paper = {THPPH033}, venue = {Berlin, Germany, Aug.-Sep. 2006}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/f06/papers/THPPH033.pdf}, language = {english} } @inproceedings{nakamura:ipac17-mopva020, author = {N. Nakamura and R. Kato and T. Miyajima and M. Shimada and R. Hajima and T. Hotei}, title = {{S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography}}, booktitle = {Proc. IPAC'17}, pages = {894--897}, paper = {MOPVA020}, venue = {Copenhagen, Denmark, May 2017}, publisher = {JACoW Publishing, Geneva, Switzerland}, doi = {10.18429/JACoW-IPAC2017-MOPVA020}, url = {https://jacow.org/ipac2017/papers/MOPVA020.pdf}, language = {english} }

References

• Y. Otake et al., “Sub-Pico-Second Trigger System for the SCSS Prototype Accelerator”, in Proc. 28th Int. Free Electron Laser Conf. (FEL'06), Berlin, Germany, Aug.-Sep. 2006, paper THPPH033, pp. 645-648.
• N. Nakamura, R. Kato, T. Miyajima, M. Shimada, R. Hajima, and T. Hotei, “S2E Simulation of an ERL-Based High-Power EUV-FEL Source for Lithography”, in Proc. 8th Int. Particle Accelerator Conf. (IPAC'17), Copenhagen, Denmark, May 2017, pp. 894-897.