[n] C. Z. Antoine and R. Crooks, “Reducing Electropolishing Time with Chemical-Mechanical Polishing”, in Proc. SRF'09, Berlin, Germany, Sep. 2009, paper TUPPO071, pp. 405-405.
[n] L. Diakhate, “Finite Plasma Wakefield Accelerator”, in Proc. EPAC'88, Rome, Italy, Jun. 1988, pp. 475-478.
Use Complete Form