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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 
[n]	A. Blednykh et al., “EIC impedance and beam dynamics”, in Proc. IPAC'24, Nashville, TN, USA, May 2024, pp. 3094-3097. doi:10.18429/JACoW-IPAC2024-THPC45
[n]	R. W. Moses, R. S. Christian, A. J. Dragt, and E. A. Heighway, “Scaling Laws for Abberations in Magnetic Quadrupole Lens Systems”, in Proc. PAC'87, Washington D.C., USA, Mar. 1987, pp. 1764-1767. 

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