JaCoW Logo

Reference Search

Favourites


For Word

[n]	N. Nakamura et al., “EUV-FEL light source for future lithography”, in Proc. IPAC'23, Venice, Italy, May 2023, pp. 5149-5152. doi:10.18429/JACoW-IPAC2023-THPM123
[n]	V. H. Ranjbar, V. Lebedev, E. Lorman, and A. Xiao, “Commissioning of the Head-tail Monitoring Application for the Tevatron”, in Proc. EPAC'04, Lucerne, Switzerland, Jul. 2004, paper THPLT137, pp. 2780-2782. 

For LaTeX

Use Complete Form

For BibTeX

References

Back to search