Reference Search

Favourites

For Word

[n]	K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. IPAC'10, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150. 

[n]	M. White, “Construction, Commissioning and Operational Experience of the Advanced Photon Source (APS) Linear Accelerator”, in Proc. LINAC'96, Geneva, Switzerland, Aug. 1996, paper TU301, pp. 315-322. 

For LaTeX

%\cite{Sakaue:IPAC10-MOPEA036} \bibitem{Sakaue:IPAC10-MOPEA036} K. Sakaue, A. Endo, and M. Washio, \textquotedblleft{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}\textquotedblright, in \emph{Proc. IPAC’10}, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148--150. %\cite{White:LINAC96-TU301} \bibitem{White:LINAC96-TU301} M. White, \textquotedblleft{Construction, Commissioning and Operational Experience of the Advanced Photon Source (APS) Linear Accelerator}\textquotedblright, in \emph{Proc. LINAC’96}, Geneva, Switzerland, Aug. 1996, paper TU301, pp. 315--322.

For BibTeX

@inproceedings{sakaue:ipac10-mopea036, author = {K. Sakaue and A. Endo and M. Washio}, title = {{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}}, booktitle = {Proc. IPAC'10}, pages = {148--150}, paper = {MOPEA036}, venue = {Kyoto, Japan, May 2010}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {http://accelconf.web.cern.ch/IPAC10/papers/MOPEA036.pdf}, language = {english} } @inproceedings{white:linac96-tu301, author = {M. White}, title = {{Construction, Commissioning and Operational Experience of the Advanced Photon Source (APS) Linear Accelerator}}, booktitle = {Proc. LINAC'96}, pages = {315--322}, paper = {TU301}, venue = {Geneva, Switzerland, Aug. 1996}, series = {Linear Accelerator Conference}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/l96/papers/TU301.pdf}, language = {english} }

References

• K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. 1st Int. Particle Accelerator Conf. (IPAC'10), Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150.
• M. White, “Construction, Commissioning and Operational Experience of the Advanced Photon Source (APS) Linear Accelerator”, in Proc. 18th Int. Linear Accelerator Conf. (LINAC'96), Geneva, Switzerland, Aug. 1996, paper TU301, pp. 315-322.