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[n]	K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. IPAC'10, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150. 

[n]	D. Igarashi, A. Endo, K. Sakaue, T. Takahashi, and M. Washio, “Direct High Power Laser Diagnostic Technique on Focused Electron Bunch”, in Proc. IPAC'16, Busan, Korea, May 2016, pp. 4073-4075. doi:10.18429/JACoW-IPAC2016-THPOW057

For LaTeX

%\cite{Sakaue:IPAC10-MOPEA036} \bibitem{Sakaue:IPAC10-MOPEA036} K. Sakaue, A. Endo, and M. Washio, \textquotedblleft{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}\textquotedblright, in \emph{Proc. IPAC’10}, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148--150. %\cite{Igarashi:IPAC16-THPOW057} \bibitem{Igarashi:IPAC16-THPOW057} D. Igarashi, A. Endo, K. Sakaue, T. Takahashi, and M. Washio, \textquotedblleft{Direct High Power Laser Diagnostic Technique on Focused Electron Bunch}\textquotedblright, in \emph{Proc. IPAC’16}, Busan, Korea, May 2016, pp. 4073--4075. \doi{10.18429/JACoW-IPAC2016-THPOW057}

For BibTeX

@inproceedings{sakaue:ipac10-mopea036, author = {K. Sakaue and A. Endo and M. Washio}, title = {{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}}, booktitle = {Proc. IPAC'10}, pages = {148--150}, paper = {MOPEA036}, venue = {Kyoto, Japan, May 2010}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {http://accelconf.web.cern.ch/IPAC10/papers/MOPEA036.pdf}, language = {english} } @inproceedings{igarashi:ipac16-thpow057, author = {D. Igarashi and A. Endo and K. Sakaue and T. Takahashi and M. Washio}, title = {{Direct High Power Laser Diagnostic Technique on Focused Electron Bunch}}, booktitle = {Proc. IPAC'16}, pages = {4073--4075}, paper = {THPOW057}, venue = {Busan, Korea}, series = {International Particle Accelerator Conference}, number = {7}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {6}, year = {2016}, doi = {10.18429/JACoW-IPAC2016-THPOW057}, url = {https://jacow.org/ipac2016/papers/THPOW057.pdf}, language = {english} }

References

• K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. 1st Int. Particle Accelerator Conf. (IPAC'10), Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150.
• D. Igarashi, A. Endo, K. Sakaue, T. Takahashi, and M. Washio, “Direct High Power Laser Diagnostic Technique on Focused Electron Bunch”, in Proc. 7th Int. Particle Accelerator Conf. (IPAC'16), Busan, Korea, May 2016, pp. 4073-4075.