[n] J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.
Use Abbreviated Form
Paper Title: Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials
Conference: 19th Particle Accelerator Conf. (PAC'01)
Paper ID: FOAA008