[n] Y. Park et al., “Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm”, in Proc. 38th Int. Free Electron Laser Conf. (FEL'17), Santa Fe, NM, USA, Aug. 2017, pp. 49-52. doi:10.18429/JACoW-FEL2017-MOP011
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Paper Title: Strongly Tapered Undulator Design for High Efficiency and High Gain Amplification at 266 nm
Paper URL: https://jacow.org/fel2017/papers/MOP011.pdf
Conference: 38th Int. Free Electron Laser Conf. (FEL'17)
Paper ID: MOP011
Location in proceedings: 49-52
Original Author String: Y. Park,D. L. Bruhwiler,C. C. Hall,A. Y. Murokh,P. Musumeci,N. S. Sudar,Y. Sun,S. D. Webb,A. Zholents