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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 

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Paper Title: Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials
Conference: 19th Particle Accelerator Conf. (PAC'01)
Paper ID: FOAA008

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