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[n]	W. Hartung et al., “Measurements of Secondary Electron Yield of Metal Surfaces and Films with Exposure to a Realistic Accelerator Environment”, in Proc. IPAC'13, Shanghai, China, May 2013, paper THPFI087, pp. 3493-3495. 

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Paper Title: Measurements of Secondary Electron Yield of Metal Surfaces and Films with Exposure to a Realistic Accelerator Environment
Paper URL: https://jacow.org/IPAC2013/papers/THPFI087.pdf
Conference: 4th Int. Particle Accelerator Conf. (IPAC'13)
Paper ID: THPFI087
Location in proceedings: 3493-3495
Original Author String: W. Hartung, J.V. Conway, C.A. Dennett, S. Greenwald, J.-S. Kim, Y. Li, T.P. Moore, V. Omanovic [CLASSE, Ithaca, New York, USA]

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