[n] Y. Okii et al., “R&D of Copper Electroplating Process for Power Couplers: Effect of Microstructures on RRR”, in Proc. SRF'19, Dresden, Germany, Jun.-Jul. 2019, pp. 278-281. doi:10.18429/JACoW-SRF2019-MOP083
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Paper Title: R&D of Copper Electroplating Process for Power Couplers: Effect of Microstructures on RRR
Paper URL: https://jacow.org/srf2019/papers/MOP083.pdf
Conference: 19th Int. Conf. RF Superconductivity (SRF'19)
Paper ID: MOP083
Location in proceedings: 278-281
Original Author String: Y. Okii,E. Kako,S. Michizono,J. Taguchi,H. Takahashi,Y. Yamamoto,H. Yasutake