[n] O. A. Tanaka, T. Miyajima, N. Nakamura, and T. Tanikawa, “Injector Design Towards ERL-Based EUV-FEL for Lithography”, in Proc. IPAC'22, Bangkok, Thailand, Jun. 2022, pp. 2299-2302. doi:10.18429/JACoW-IPAC2022-WEPOMS025
%\cite{Tanaka:IPAC22-WEPOMS025} \bibitem{Tanaka:IPAC22-WEPOMS025} O. A. Tanaka, T. Miyajima, N. Nakamura, and T. Tanikawa, \textquotedblleft{Injector Design Towards ERL-Based EUV-FEL for Lithography}\textquotedblright, in \emph{Proc. IPAC’22}, Bangkok, Thailand, Jun. 2022, pp. 2299--2302. \doi{10.18429/JACoW-IPAC2022-WEPOMS025}
@inproceedings{tanaka:ipac22-wepoms025, author = {O. A. Tanaka and T. Miyajima and N. Nakamura and T. Tanikawa}, title = {{Injector Design Towards ERL-Based EUV-FEL for Lithography}}, booktitle = {Proc. IPAC'22}, pages = {2299--2302}, paper = {WEPOMS025}, venue = {Bangkok, Thailand}, series = {International Particle Accelerator Conference}, number = {13}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {7}, year = {2022}, issn = {2673-5490}, isbn = {978-3-95-450227-1}, doi = {10.18429/JACoW-IPAC2022-WEPOMS025}, url = {https://jacow.org/IPAC2022/papers/WEPOMS025.pdf}, language = {english} }