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[n]	W. T. Chu, S. B. Curtis, J. Llacer, T. R. Renner, and R. W. Sorensen, “Wobbler Facility for Biomedical Experiments at the Bevalac”, in Proc. PAC'85, Vancouver, Canada, May 1985, pp. 3321-3324. 

[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 

For LaTeX

%\cite{Chu:PAC85} \bibitem{Chu:PAC85} W. T. Chu, S. B. Curtis, J. Llacer, T. R. Renner, and R. W. Sorensen, \textquotedblleft{Wobbler Facility for Biomedical Experiments at the Bevalac}\textquotedblright, in \emph{Proc. PAC’85}, Vancouver, Canada, May 1985, pp. 3321--3324. %\cite{Poate:PAC01-FOAA008} \bibitem{Poate:PAC01-FOAA008} J. Poate and M. I. Current, \textquotedblleft{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}\textquotedblright, presented at the PAC’01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.

For BibTeX

@inproceedings{chu:pac85, author = {W. T. Chu and S. B. Curtis and J. Llacer and T. R. Renner and R. W. Sorensen}, title = {{Wobbler Facility for Biomedical Experiments at the Bevalac}}, booktitle = {Proc. PAC'85}, pages = {3321--3324}, paper = {}, venue = {Vancouver, Canada, May 1985}, publisher = {JACoW Publishing, Geneva, Switzerland}, language = {english} } @unpublished{poate:pac01-foaa008, author = {J. Poate and M. I. Current}, title = {{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}}, booktitle = {Proc. PAC'01}, paper = {FOAA008}, venue = {Chicago, IL, USA, Jun. 2001}, intype = {presented at the}, publisher = {JACoW Publishing, Geneva, Switzerland}, note = {presented at PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished}, language = {english} }

References

• W. T. Chu, S. B. Curtis, J. Llacer, T. R. Renner, and R. W. Sorensen, “Wobbler Facility for Biomedical Experiments at the Bevalac”, in Proc. 11th Particle Accelerator Conf. (PAC'85), Vancouver, Canada, May 1985, pp. 3321-3324.
• J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.