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[n]	R. E. Laxdal, T. J. Buck, S. Gheidi, R. Kiefl, M. Liepe, and S. Posen, “Testing Nb3Sn Coating Using muSR”, in Proc. SRF'15, Whistler, Canada, Sep. 2015, paper TUPB041, pp. 651-655. 

[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 

For LaTeX

%\cite{Laxdal:SRF15-TUPB041} \bibitem{Laxdal:SRF15-TUPB041} R. E. Laxdal, T. J. Buck, S. Gheidi, R. Kiefl, M. Liepe, and S. Posen, \textquotedblleft{Testing Nb3Sn Coating Using muSR}\textquotedblright, in \emph{Proc. SRF’15}, Whistler, Canada, Sep. 2015, paper TUPB041, pp. 651--655. %\cite{Poate:PAC01-FOAA008} \bibitem{Poate:PAC01-FOAA008} J. Poate and M. I. Current, \textquotedblleft{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}\textquotedblright, presented at the PAC’01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.

For BibTeX

@inproceedings{laxdal:srf15-tupb041, author = {R. E. Laxdal and T. J. Buck and S. Gheidi and R. Kiefl and M. Liepe and S. Posen}, title = {{Testing Nb3Sn Coating Using muSR}}, booktitle = {Proc. SRF'15}, pages = {651--655}, paper = {TUPB041}, venue = {Whistler, Canada, Sep. 2015}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/SRF2015/papers/TUPB041.pdf}, language = {english} } @unpublished{poate:pac01-foaa008, author = {J. Poate and M. I. Current}, title = {{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}}, booktitle = {Proc. PAC'01}, paper = {FOAA008}, venue = {Chicago, IL, USA, Jun. 2001}, intype = {presented at the}, publisher = {JACoW Publishing, Geneva, Switzerland}, note = {presented at PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished}, language = {english} }

References

• R. E. Laxdal, T. J. Buck, S. Gheidi, R. Kiefl, M. Liepe, and S. Posen, “Testing Nb3Sn Coating Using muSR”, in Proc. 17th Int. Conf. RF Superconductivity (SRF'15), Whistler, Canada, Sep. 2015, paper TUPB041, pp. 651-655.
• J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.