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[n]	J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. 

[n]	M. Alredhi et al., “Status Report and Future Plan for Molecular Imaging Center (I-One) Facility”, in Proc. Cyclotrons'22, Beijing, China, Dec. 2022, paper WEPO009, pp. 223-224. doi:10.18429/JACoW-CYCLOTRONS2022-WEPO009

For LaTeX

%\cite{Poate:PAC01-FOAA008} \bibitem{Poate:PAC01-FOAA008} J. Poate and M. I. Current, \textquotedblleft{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}\textquotedblright, presented at the PAC’01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished. %\cite{Alredhi:Cyclotrons22-WEPO009} \bibitem{Alredhi:Cyclotrons22-WEPO009} M. Alredhi \emph{et al.}, \textquotedblleft{Status Report and Future Plan for Molecular Imaging Center (I-One) Facility}\textquotedblright, in \emph{Proc. Cyclotrons’22}, Beijing, China, Dec. 2022, paper WEPO009, pp. 223--224. \doi{10.18429/JACoW-CYCLOTRONS2022-WEPO009}

For BibTeX

@unpublished{poate:pac01-foaa008, author = {J. Poate and M. I. Current}, title = {{Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials}}, booktitle = {Proc. PAC'01}, paper = {FOAA008}, venue = {Chicago, IL, USA, Jun. 2001}, intype = {presented at the}, publisher = {JACoW Publishing, Geneva, Switzerland}, note = {presented at PAC'01, Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished}, language = {english} } @inproceedings{alredhi:cyclotrons22-wepo009, author = {M. Alredhi and others}, title = {{Status Report and Future Plan for Molecular Imaging Center (I-One) Facility}}, booktitle = {Proc. Cyclotrons'22}, pages = {223--224}, paper = {WEPO009}, venue = {Beijing, China}, series = {International Conference on Cyclotrons and their Applications}, number = {23}, publisher = {JACoW Publishing, Geneva, Switzerland}, month = {3}, year = {2023}, issn = {2673-5482}, isbn = {978-3-95-450212-7}, doi = {10.18429/JACoW-CYCLOTRONS2022-WEPO009}, language = {english} }

References

• J. Poate and M. I. Current, “Industrial Applications of Ion Implantation for Doping and Modification of Semiconductor Materials”, presented at the 19th Particle Accelerator Conf. (PAC'01), Chicago, IL, USA, Jun. 2001, paper FOAA008, unpublished.
• M. Alredhi et al., “Status Report and Future Plan for Molecular Imaging Center (I-One) Facility”, in Proc. 23rd Int. Conf. Cyclotrons Appl. (Cyclotrons'22), Beijing, China, Dec. 2022, paper WEPO009, pp. 223-224.