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[n]	K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. IPAC'10, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150. 

For LaTeX

%\cite{Sakaue:IPAC10-MOPEA036} \bibitem{Sakaue:IPAC10-MOPEA036} K. Sakaue, A. Endo, and M. Washio, \textquotedblleft{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}\textquotedblright, in \emph{Proc. IPAC’10}, Kyoto, Japan, May 2010, paper MOPEA036, pp. 148--150.

For BibTeX

@inproceedings{sakaue:ipac10-mopea036, author = {K. Sakaue and A. Endo and M. Washio}, title = {{Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection}}, booktitle = {Proc. IPAC'10}, pages = {148--150}, paper = {MOPEA036}, venue = {Kyoto, Japan, May 2010}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {http://accelconf.web.cern.ch/IPAC10/papers/MOPEA036.pdf}, language = {english} }

References

• K. Sakaue, A. Endo, and M. Washio, “Design of High Brightness Light Source based on Laser-Compton Undulator for EUV Lithography Mask Inspection”, in Proc. 1st Int. Particle Accelerator Conf. (IPAC'10), Kyoto, Japan, May 2010, paper MOPEA036, pp. 148-150.