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[n]	J. Upadhyay, M. Nikolic, S. Popovic, L. Vuskovic, H. L. Phillips, and A-M. Valente-Feliciano, “Optimization of Ar/CL2 Plasma Parameters Used for SRF Cavity Etching”, in Proc. SRF'11, Chicago, IL, USA, Jul. 2011, paper TUPO043, pp. 479-481. 

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