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[n]	M. Kodaira, O. Asai, N. Awaji, M. Haraguchi, and T. Kishimoto, “Performance of SORTEC 1-GeV Synchrotron Radiation Source Facility and Future Plan”, in Proc. EPAC'92, Berlin, Germany, Mar. 1992, pp. 203-206. 

[n]	A. Heuberger, “Lithography Production Techniques for next Generations of Microelectronics”, in Proc. EPAC'92, Berlin, Germany, Mar. 1992, pp. 192-197. 

For LaTeX

%\cite{Kodaira:EPAC92} \bibitem{Kodaira:EPAC92} M. Kodaira, O. Asai, N. Awaji, M. Haraguchi, and T. Kishimoto, \textquotedblleft{Performance of SORTEC 1-GeV Synchrotron Radiation Source Facility and Future Plan}\textquotedblright, in \emph{Proc. EPAC’92}, Berlin, Germany, Mar. 1992, pp. 203--206. %\cite{Heuberger:EPAC92} \bibitem{Heuberger:EPAC92} A. Heuberger, \textquotedblleft{Lithography Production Techniques for next Generations of Microelectronics}\textquotedblright, in \emph{Proc. EPAC’92}, Berlin, Germany, Mar. 1992, pp. 192--197.

For BibTeX

@inproceedings{kodaira:epac92, author = {M. Kodaira and O. Asai and N. Awaji and M. Haraguchi and T. Kishimoto}, title = {{Performance of SORTEC 1-GeV Synchrotron Radiation Source Facility and Future Plan}}, booktitle = {Proc. EPAC'92}, pages = {203--206}, paper = {}, venue = {Berlin, Germany, Mar. 1992}, series = {European Particle Accelerator Conference}, number = {3}, publisher = {JACoW Publishing, Geneva, Switzerland}, language = {english} } @inproceedings{heuberger:epac92, author = {A. Heuberger}, title = {{Lithography Production Techniques for next Generations of Microelectronics}}, booktitle = {Proc. EPAC'92}, pages = {192--197}, paper = {}, venue = {Berlin, Germany, Mar. 1992}, series = {European Particle Accelerator Conference}, number = {3}, publisher = {JACoW Publishing, Geneva, Switzerland}, language = {english} }

References

• M. Kodaira, O. Asai, N. Awaji, M. Haraguchi, and T. Kishimoto, “Performance of SORTEC 1-GeV Synchrotron Radiation Source Facility and Future Plan”, in Proc. 3rd European Particle Accelerator Conf. (EPAC'92), Berlin, Germany, Mar. 1992, pp. 203-206.
• A. Heuberger, “Lithography Production Techniques for next Generations of Microelectronics”, in Proc. 3rd European Particle Accelerator Conf. (EPAC'92), Berlin, Germany, Mar. 1992, pp. 192-197.