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[n]	G. Wu et al., “ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities”, in Proc. SRF'07, Beijing, China, Oct. 2007, paper TUP49, pp. XX-XX. 

[n]	H. P. Bohlen, “Advanced High-Power Microwave Vacuum Electron Device Development”, in Proc. PAC'99, New York, NY, USA, Mar. 1999, paper THBL3, pp. 445-449. 

For LaTeX

%\cite{Wu:SRF07-TUP49} \bibitem{Wu:SRF07-TUP49} G. Wu \emph{et al.}, \textquotedblleft{ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities}\textquotedblright, in \emph{Proc. SRF’07}, Beijing, China, Oct. 2007, paper TUP49, pp. XX--XX. %\cite{Bohlen:PAC99-THBL3} \bibitem{Bohlen:PAC99-THBL3} H. P. Bohlen, \textquotedblleft{Advanced High-Power Microwave Vacuum Electron Device Development}\textquotedblright, in \emph{Proc. PAC’99}, New York, NY, USA, Mar. 1999, paper THBL3, pp. 445--449.

For BibTeX

@inproceedings{wu:srf07-tup49, author = {G. Wu and others}, title = {{ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities}}, booktitle = {Proc. SRF'07}, paper = {TUP49}, venue = {Beijing, China, Oct. 2007}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/srf2007/papers/TUP49.pdf}, language = {english} } @inproceedings{bohlen:pac99-thbl3, author = {H. P. Bohlen}, title = {{Advanced High-Power Microwave Vacuum Electron Device Development}}, booktitle = {Proc. PAC'99}, pages = {445--449}, paper = {THBL3}, venue = {New York, NY, USA, Mar. 1999}, publisher = {JACoW Publishing, Geneva, Switzerland}, url = {https://jacow.org/p99/papers/THBL3.pdf}, language = {english} }

References

• G. Wu et al., “ECR Plasma Cleaning: An In-situ Processing Technique for RF Cavities”, in Proc. 13th Int. Conf. RF Superconductivity (SRF'07), Beijing, China, Oct. 2007, paper TUP49, pp. XX-XX.
• H. P. Bohlen, “Advanced High-Power Microwave Vacuum Electron Device Development”, in Proc. 18th Particle Accelerator Conf. (PAC'99), New York, NY, USA, Mar. 1999, paper THBL3, pp. 445-449.